An integrated circuit (IC) technique developed by Fairchild Instruments in 1959 that creates transistors on a flat surface compared to the uneven surface of the earlier mesa process. The planar transistor, which also creates connecting lines by depositing metal conductors, superseded the mesa method and was a major step forward in the evolution of the chip.
Still Used
Although transistors in top-end chips migrated from planar to the FinFET architecture in the 2010s, planar is still used in microcontrollers, IoT sensors, analog chips and other low-cost circuits.
Planar -> FinFET -> GAAFET -> CFET
The transistor migration is planar to FinFET to GAAFET, the latter emerging in the mid-2020s. Mass marketing of CFETs are expected by 2030. See
FinFET,
GAAFET,
CFET and
chip manufacturing.
The First Planar IC
In 1960, Fairchild Semiconductor introduced the first planar integrated circuit, which went into production a year later. Fairchild co-founder Robert Noyce had previously filed for a patent on the planar process, which used his interconnection idea and Jean Hoerni's planar method. (Image courtesy of Fairchild Semiconductor.)